Patent 01255955. Inventor: Zhang Xingquan.
A permanent-magnet planar magnetron sputter target including permanent magnets, with a magnetic pole cap on the upper face — cross-section may be rectangular, trapezoidal, wedge, triangular, conical, semicircular, or other shape. On the magnet’s lower face is a magnetic trim shim, fixed to a pole piece, which is supported on the magnetron body by a lifting adjustment screw. The outer ring of permanents is capped with shorting poles on its outer face. This utility model produces a uniform spatial field, raises coating quality, lifts target utilisation to ~60%, offers wide magnetic adjustment, eliminates stray fields, and prevents arcing in non-use areas. Contact: 13823228656